AFM and Raman studies of topological insulator materials subject to argon plasma etching

AFM and Raman studies of topological insulator materials subject to argon plasma etching Isaac Childres a b , Jifa Tian a b , Ireneusz Miotkowski a b & Yong Chen a b c a Department of Physics, Purdue University, West Lafayette, IN 47907, USA b Birck Nanotechnology Center, Purdue University, West Lafayette, IN 47907, USA c School of Electrical and Computer Engineering, Purdue University, West Lafayette, IN 47907, USA Version of record first published: 26 Sep 2012.